MKS 0190-40602 远程等离子源

MKS  0190-40602 远程等离子源

1.产 品 资 料 介 绍：

中文资料：

MKS 0190-40602 远程等离子源 是 MKS Instruments 提供的一款高效等离子源系统，专为精密的材料处理应用设计，尤其在半导体制造、薄膜沉积、表面处理等工艺中具有广泛应用。它通过远程产生等离子体，有效提高了工作效率并提供稳定的等离子体源。

主要特点：

1. 稳定性高：

   • 该远程等离子源提供稳定的等离子体生成，确保在各种应用中维持高一致性的性能。其稳定性对于半导体制造和薄膜沉积等要求严格的工艺非常重要。

2. 高效能：

   • 其设计使得系统能在低功率下保持高效的等离子体生成，有效降低能量消耗，同时提升等离子体源的工作效率。

3. 远程操作：

   • 可以通过远程操作控制等离子体生成和调节过程，从而减少人为干预并简化操作。

4. 低维护需求：

   • 由于采用了先进的设计和技术，该远程等离子源具有低维护需求，能显著减少停机时间和维护成本。

5. 灵活性：

   • MKS 0190-40602 具有高灵活性，可根据不同的应用需求调节其输出，适用于各种不同的工业和科研应用。

英文资料：

The MKS 0190-40602 remote plasma source is an efficient plasma source system provided by MKS Instruments, designed specifically for precision material processing applications, particularly in semiconductor manufacturing, thin film deposition, surface treatment, and other processes. It effectively improves work efficiency and provides a stable plasma source by generating plasma remotely.

Main features:

High stability:

This remote plasma source provides stable plasma generation, ensuring high consistency performance in various applications. Its stability is crucial for processes with strict requirements such as semiconductor manufacturing and thin film deposition.

High efficiency:

Its design enables the system to maintain efficient plasma generation at low power, effectively reducing energy consumption while improving the efficiency of the plasma source.

Remote operation:

The plasma generation and regulation process can be controlled remotely, reducing human intervention and simplifying operations.

Low maintenance requirements:

Due to the adoption of advanced design and technology, this remote plasma source has low maintenance requirements and can significantly reduce downtime and maintenance costs.

Flexibility:

MKS 0190-40602 has high flexibility and can adjust its output according to different application needs, suitable for various industrial and scientific research applications.

2.产      品      展      示      

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