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ENI OEM-12B-07射频发生器

发布时间:2025-03-05人气:
  • ENI OEM-12B-07射频发生器
  • ENI OEM-12B-07射频发生器
  • ENI OEM-12B-07射频发生器

ENI OEM-12B-07射频发生器 

1.产 品 资 料 介 绍:

中文资料:

ENI(Electronics & Innovation)生产的 OEM-12B-07 型号是一款射频(RF)发生器,广泛应用于工业和实验室环境中的等离子体处理、半导体制造和材料加工等领域。

主要特点:

  • 高功率输出:该射频发生器提供高达 1250W 的功率输出,适用于需要高功率密度的工艺过程。

  • 宽输入电压范围:支持 190-250V 的交流输入电压,兼容不同地区的电力标准。

  • 频率范围:通常工作在 13.56 MHz 等常见射频频率,适应多种工业应用需求。

应用领域:

  • 半导体制造:用于等离子体刻蚀、化学气相沉积(CVD)等工艺,为工艺腔体提供稳定的射频能量。

  • 材料加工:在等离子体增强化学气相沉积(PECVD)和物理气相沉积(PVD)过程中,用于薄膜沉积和表面改性。

  • 工业加热:适用于感应加热和电介质加热设备,如塑料焊接、硅晶体生长等应用。

英文资料:

The OEM-12B-07 model produced by ENI (Electronics&Innovation) is a radio frequency (RF) generator widely used in fields such as plasma processing, semiconductor manufacturing, and material processing in industrial and laboratory environments.

Main features:

High power output: This RF generator provides up to 1250W of power output, suitable for processes that require high power density.

Wide input voltage range: Supports AC input voltage of 190-250V, compatible with power standards in different regions.

Frequency range: typically operates at common RF frequencies such as 13.56 MHz, suitable for various industrial application requirements.

Application areas:

Semiconductor manufacturing: used in processes such as plasma etching and chemical vapor deposition (CVD) to provide stable RF energy to the process chamber.

Material processing: Used for thin film deposition and surface modification in plasma enhanced chemical vapor deposition (PECVD) and physical vapor deposition (PVD) processes.

Industrial heating: suitable for induction heating and dielectric heating equipment, such as plastic welding, silicon crystal growth and other applications.

2.产      品      展      示      

OEM-12B-07.webp (3).jpg

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